Staff Profile
Dr Kelvin Kwa
Research Associate
- Fax: +44 (0)191 208 8180
- Address: E4.12
Electrical and Electronic Engineering
School of Engineering
Merz Court
缅北禁地
缅北禁地 upon Tyne
NE1 7RU, UK
Research
Kelvin is a member of the Emerging Technologies and Materials research group.
Publications
- Mojarad SA, Kwa KSK, Goss JP, Zhou Z, Ponon NK, Appleby DJR, Al Hamadany RAS, O'Neill A. . Journal of Applied Physics 2012, 111(1), 014503.
- Mojarad SA, Goss JP, Kwa KSK, Petrov PK, Zou B, Alford N, O'Neill A. . Journal of Applied Physics 2012, 112(12), 124516.
- Mojarad SA, Goss JP, Kwa KSK, Zhou ZY, Al-Hamadany RAS, Appleby DJR, Ponon NK, O'Neill A. . Applied Physics Letters 2012, 101(17), 173507.
- Za'bah NF, Kwa KSK, Bowen L, Mendis B, O'Neill A. . Journal of Applied Physics 2012, 112(2), 024309.
- Alatise O, Kwa K, Olsen S, O'Neill A. . In: International Semiconductor Device Research Symposium (ISDRS). 2009, College Park, Maryland, USA.
- Olsen SH, O'Neill AG, Chattopadhyay S, Kwa KSK, Driscoll LS, Norris DJ, Cullis AG, Robbins DJ, Zhang J. . Journal of Applied Physics 2004, 95(10), 5931-5933.
- Driscoll L, Olsen S, Chattopadhyay S, O'Neill A, Kwa K, Dobrosz P, Bull S. . In: High-Mobility Group IV Materials and Devices. 2004, San Francisco, California, USA: Materials Research Society.
- Olsen S, Driscoll L, Kwa K, Chattopadhyay S, O'Neill A, Waite A, Tang Y, Evans A, Norris D, Cullis A, Paul D, Robbins D. . In: Third International Conference on SiGe(C) Epitaxy and Heterostructures. 2003, Santa Fe, New Mexico, USA.
- Olsen SH, Driscoll LS, Kwa KSK, Chattopadhyay S, O'Neill AG. . In: International Conference on Solid State Devices and Materials (SSDM). 2003, Tokyo, Japan.
- Olsen SH, Driscoll LS, Kwa KSK, Chattopadhyay S, O'Neill AG, Waite AM, Tang YT, Evans AGR, Norris DJ, Cullis AG, Paul DJ, Robbins DJ. . In: International Conference on Silicon Epitaxy and Heterostructures (ICSI3). 2003, Santa Fe, New Mexico, USA.
- Olsen SHJ, O'Neill AG, Chattopadhyay S, Kwa KSK, Driscoll LS, Bull SJ, Waite AM, Tang YT, Evans AGR, Norris DJ, Cullis AG, Zhang J. . In: Electronic Materials Conference. 2003, Salt Lake City, Utah, USA.
- Olsen SH, O'Neill AG, Chattopadhyay S, Kwa KSK, Driscoll LS, Bull SJ, Waite AM, Tang YT, Evans AGR, Norris DJ, Cullis AG, Zhang J. . In: Electronic Materials Conference (EMC). 2003, Salt Lake City, Utah, USA.
- Kwa KSK, Chattopadhyay S, Olsen SH, Driscoll LS, O'Neill AG. . In: 33rd European Solid-State Device Research. 2003, Estoril, Portugal: IEEE.
- Kwa K, Chattopadhyay S, Olsen S, Driscoll L, O'Neill AG. . In: Proc ESSDERC. 2003, Lisbon, Portugal.
- Kwa KSK, Chattopadhyay S, Olsen SH, Driscoll LS, O'Neill AG. . In: 33rd European Solid-State Device Research Conference (ESSDERC). 2003, Estoril, Portugal: IEEE.
- Kwa KS, ONeill AG. Diffusion of Boron in Stained Si-SiGe. In: PREP Conference. 2001, Keele.
- Ramadan S, Kwa K, King P, O'Neill A. . Nanotechnology 2016, 27(42), 425302.
- Ponon NK, Appleby DJR, Arac E, King PJ, Ganti S, Kwa KSK, O'Neill A. . Thin Solid Films 2015, 578, 31-37.
- Za'bah NF, Kwa KSK, O'Neill A. . In: 5th International Conference on Mechanical and Manufacturing Engineering (ICME 2014). 2014, Bandung, Indonesia: Trans Tech Publications Ltd.
- Appleby DJR, Ponon NK, Kwa KSK, Zou B, Petrov PK, Wang T, Alford NM, O'Neill A. . Nano Letters 2014, 14(7), 3864-3868.
- King PJ, Arac E, Ganti S, Ramadan S, Kwa KSK, Barlow AJ, Cumpson PJ, Robertson J, O'Neill AG. . In: 12th International Baltic ALD 2014. 2014, Helsinki, Finland.
- Appleby DJR, Ponon NK, Kwa KSK, Ganti S, Hannemann U, Petrov PK, Alford NM, O'Neill AG. . Journal of Applied Physics 2014, 116, 124105.
- Ponon NK, Appleby DJR, Arac E, Kwa KSK, Goss JP, Hannemann U, Petrov PK, Alford NM, O'Neill A. . In: MRS Fall Meeting and Exhibit. 2014, Boston, MA, USA: Cambridge University Press.
- King PJ, Arac E, Ganti S, Kwa KSK, Ponon N, O'Neill AG. . Applied Physics Letters 2014, 105(5), 052101.
- O'Neill A, Appleby D, Ponon N, Kwa K. . In: 12th IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT). 2014, Guilin, China: IEEE.
- Ponon N, Appleby D, Mojarad SA, Kwa K, O'Neill A. . In: Intel ERIC. 2012, Dublin, Ireland.